Optics and Precision Engineering, Volume. 15, Issue 8, 1263(2007)

Evaluation of efficiency for silicon wafer cleaning by image processing

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]
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    References(6)

    [1] [1] ANDREW C T,HEE K P,COSTAS P G.Laser cleaning of surface contaminants[J].Applied Surface Science,1998,127(129):721-725.

    [4] [4] MITTAL K L.Particles on Surfaces:Ⅲ[M].New York:Plenum Press,1991.

    [5] [5] SONG W D,HONG M H,ZHANG L,et al..Laser cleaning technology and its application[J].SPIE,2002,4426:280-283.

    [6] [6] FERNANDES A,KANE D.Dry laser cleaning threshold fluency-How can it be measured accurately[J].SPIE,2002,4426:290-295.

    [10] [10] NEBES P,ARRONTE M,VILAR R,et al..KrF excimer laser dry and steam cleaning of silicon surfaces with metallic particulate contaminants[J].Appl.Phys.,2002(74):191-199.

    [12] [12] RAFAEL C G,RICHARD E W.Digital Image Processing (second edition)[M].Beijing:Publishing House of Electronics Industry,2002.

    CLP Journals

    [1] Xue Yafei, Wang Wei, Wang Xuefeng, Wang Junlong, Li Guang, Gao Wenyan, Li Benhai, Li Kai. Laser cleaning technology of 38CrMoAl material surface pollutants[J]. Infrared and Laser Engineering, 2018, 47(7): 706004

    [2] Wang Min, Zhou Jianzhong, Huang Shu, Hu Lingling. Research Status and Application of Laser Cleaning[J]. Chinese Journal of Lasers, 2009, 36(s1): 174

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Evaluation of efficiency for silicon wafer cleaning by image processing[J]. Optics and Precision Engineering, 2007, 15(8): 1263

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    Paper Information

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    Received: Feb. 6, 2007

    Accepted: --

    Published Online: Feb. 18, 2008

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