Optics and Precision Engineering, Volume. 15, Issue 8, 1263(2007)
Evaluation of efficiency for silicon wafer cleaning by image processing
[1] [1] ANDREW C T,HEE K P,COSTAS P G.Laser cleaning of surface contaminants[J].Applied Surface Science,1998,127(129):721-725.
[4] [4] MITTAL K L.Particles on Surfaces:Ⅲ[M].New York:Plenum Press,1991.
[5] [5] SONG W D,HONG M H,ZHANG L,et al..Laser cleaning technology and its application[J].SPIE,2002,4426:280-283.
[6] [6] FERNANDES A,KANE D.Dry laser cleaning threshold fluency-How can it be measured accurately[J].SPIE,2002,4426:290-295.
[10] [10] NEBES P,ARRONTE M,VILAR R,et al..KrF excimer laser dry and steam cleaning of silicon surfaces with metallic particulate contaminants[J].Appl.Phys.,2002(74):191-199.
[12] [12] RAFAEL C G,RICHARD E W.Digital Image Processing (second edition)[M].Beijing:Publishing House of Electronics Industry,2002.
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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Evaluation of efficiency for silicon wafer cleaning by image processing[J]. Optics and Precision Engineering, 2007, 15(8): 1263