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Chinese Journal of Lasers, Volume. 16, Issue 8, 483(1989)

Laser scanner for localized and rapid annealing of silicon surraces

Gao Wenqi, Ye Quanshu, and Huang Xinfan
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    [1] [1] о Bryndohl, W Η Lee, Appl. Opt. 15 (1). 183 (1976)

    [2] [2] W Η Lee, "Ed by E. Wolf; Progress in Optirs VoJ. 16"(North-Holland Pub. Соmр., Amsterdam New York, Oxford, 1978), 228

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    Gao Wenqi, Ye Quanshu, Huang Xinfan. Laser scanner for localized and rapid annealing of silicon surraces[J]. Chinese Journal of Lasers, 1989, 16(8): 483

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    Paper Information

    Category: laser manufacturing

    Received: Nov. 19, 1987

    Accepted: --

    Published Online: Aug. 13, 2012

    The Author Email:

    DOI:

    CSTR:32186.14.

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology