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Acta Optica Sinica, Volume. 32, Issue 2, 212001(2012)

Interference Fringe Pattern Phase Analysis in Alignment of Nanolithography

Xu Feng1,2、*, Hu Song1, Zhou Shaolin1,2, and Xu Wenxiang1
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  • 1[in Chinese]
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    Article index updated: Mar. 10, 2025

    The article is cited by 2 article(s) CLP online library. (Some content might be in Chinese.)
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    Xu Feng, Hu Song, Zhou Shaolin, Xu Wenxiang. Interference Fringe Pattern Phase Analysis in Alignment of Nanolithography[J]. Acta Optica Sinica, 2012, 32(2): 212001

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    Paper Information

    Category: Instrumentation, Measurement and Metrology

    Received: May. 13, 2011

    Accepted: --

    Published Online: Jan. 11, 2012

    The Author Email: Feng Xu (casxufeng@gmail.com)

    DOI:10.3788/aos201232.0212001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology