Journal of Synthetic Crystals, Volume. 53, Issue 7, 1196(2024)
Numerical Simulation of the Effect of Heat Shield Structure on Temperature Distribution in Growing 300 mm Semiconductor Grade Monocrystalline Silicon
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NI Haoran, CHEN Ya, WANG Liguang, RUI Yang, ZHAO Zehui, MA Cheng, LIU Jie, ZHANG Xingmao, ZHAO Yanxiang, YANG Shaolin. Numerical Simulation of the Effect of Heat Shield Structure on Temperature Distribution in Growing 300 mm Semiconductor Grade Monocrystalline Silicon[J]. Journal of Synthetic Crystals, 2024, 53(7): 1196
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Received: Feb. 15, 2024
Accepted: --
Published Online: Aug. 22, 2024
The Author Email: YANG Shaolin (slyang@nun.edu.cn)
CSTR:32186.14.