Journal of Synthetic Crystals, Volume. 53, Issue 7, 1196(2024)

Numerical Simulation of the Effect of Heat Shield Structure on Temperature Distribution in Growing 300 mm Semiconductor Grade Monocrystalline Silicon

NI Haoran1, CHEN Ya2, WANG Liguang1, RUI Yang1, ZHAO Zehui1, MA Cheng1, LIU Jie1, ZHANG Xingmao1, ZHAO Yanxiang1, and YANG Shaolin2、*
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less
    Figures & Tables(0)
    Tools

    Get Citation

    Copy Citation Text

    NI Haoran, CHEN Ya, WANG Liguang, RUI Yang, ZHAO Zehui, MA Cheng, LIU Jie, ZHANG Xingmao, ZHAO Yanxiang, YANG Shaolin. Numerical Simulation of the Effect of Heat Shield Structure on Temperature Distribution in Growing 300 mm Semiconductor Grade Monocrystalline Silicon[J]. Journal of Synthetic Crystals, 2024, 53(7): 1196

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category:

    Received: Feb. 15, 2024

    Accepted: --

    Published Online: Aug. 22, 2024

    The Author Email: YANG Shaolin (slyang@nun.edu.cn)

    DOI:

    CSTR:32186.14.

    Topics