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Acta Optica Sinica, Volume. 36, Issue 10, 1012002(2016)

Measurement of Wavefront Aberration of Extreme Ultraviolet Lithographic Projection Lens Based on Ptychography

Fang Wei1,2、*, Tang Feng1, Wang Xiangzhao1,2, Zhu Penghui1,2, Li Jie1,2, Meng Zejiang1,2, and Zhang Heng1,2
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    Article index updated: Mar. 10, 2025

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    Fang Wei, Tang Feng, Wang Xiangzhao, Zhu Penghui, Li Jie, Meng Zejiang, Zhang Heng. Measurement of Wavefront Aberration of Extreme Ultraviolet Lithographic Projection Lens Based on Ptychography[J]. Acta Optica Sinica, 2016, 36(10): 1012002

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    Received: Apr. 7, 2016

    Accepted: --

    Published Online: Oct. 12, 2016

    The Author Email: Wei Fang (fangwei20050200@163.com)

    DOI:10.3788/aos201636.1012002

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology