Journal of Semiconductors, Volume. 42, Issue 11, 114101(2021)

Investigation of time domain characteristics of negative capacitance FinFET by pulse-train approaches

Yuwei Cai1,2, Zhaohao Zhang1, Qingzhu Zhang1, Jinjuan Xiang1, Gaobo Xu1, Zhenhua Wu1, Jie Gu1,2, and Huaxiang Yin1
Author Affiliations
  • 1Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
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    Figures & Tables(8)
    (Color online) (a) The fabrication flow of the fabrication of NC FinFET. (b) Cross-sectional TEM image of the NC FinFET device. (c) Schematic diagram of the resistive load inverter characterization single-transistor frequency characteristics test circuit. (d) Schematic diagram of the optimization measurement scheme.
    (Color online) Real-time output data of the load-resistance based inverter measurement, with the gate pulse width (a) 1 ms, and (b) 10 μs, respectively.
    (Color online) Experimentally measured output voltage as a function of the applied gate signal frequencies.
    Waveforms of different frequencies displayed directly on the oscilloscope after resistive loading, (a)10 kHz and (b) 100 kHz.
    (Color online) The measured real-time pulse train on-current of single-transistor.
    (Color online) Measured transient currents of the single transistor, (a) with 10 ms pulse width, (b) with 1 μs pulse width, (c) variation of the extracted on-state currents of the single-transistor with frequency at different gate voltages.
    (Color online) Real-time test results of on-state IDS of the NC FinFET.
    (Color online) Experimentally measured variation of the on-state current with pulse width for NC FinFET and conventional FinFET. (a) NMOS. (b) PMOS.
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    Yuwei Cai, Zhaohao Zhang, Qingzhu Zhang, Jinjuan Xiang, Gaobo Xu, Zhenhua Wu, Jie Gu, Huaxiang Yin. Investigation of time domain characteristics of negative capacitance FinFET by pulse-train approaches[J]. Journal of Semiconductors, 2021, 42(11): 114101

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    Paper Information

    Category: Articles

    Received: Apr. 5, 2021

    Accepted: --

    Published Online: Nov. 12, 2021

    The Author Email:

    DOI:10.1088/1674-4926/42/11/114101

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