Chinese Journal of Liquid Crystals and Displays, Volume. 35, Issue 12, 1264(2020)
Preventing method of film residue in PR ashing process based on ICP etcher
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ZHA Fu-de, XU Chun-jie, LI Gen-fan, ZHANG Mu, CUI Li-jia, FENG Yao-yao, ZHU Mei-hua, YAN Zeng-qian, LIU Zeng-li, CHEN Zheng-wei, ZHENG Zai-run. Preventing method of film residue in PR ashing process based on ICP etcher[J]. Chinese Journal of Liquid Crystals and Displays, 2020, 35(12): 1264
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Received: Mar. 19, 2020
Accepted: --
Published Online: Dec. 28, 2020
The Author Email: ZHA Fu-de (zhafude@boe.com.cn)
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