[1] [1] Sun Lei, Dai Qingyuan, Qiao Gaoshuai et al.. Trends of lithography technology based on decreasing of the feature size［J］. Micronanoelectronic Technology, 2009, 46(3): 186～190

[2] [2] Joseph W. Perry. Two beams squeeze feature sizes in optical lithography［J］. Science, 2009, 324(5929): 892～893

[3] [3] Linjie Li, Rafael R. Gattass, Erez Gershgoren et al.. Achieving λ/20 resolution by one-color initiation and deactivation of polymerization［J］. Science, 2009, 324(5929): 910～913

[4] [4] Timothy F. Scott, Benjamin A. Kowalski, Amy C. Sullivan et al.. Two-color single-photon photoinitiation and photoinhibition for subdiffraction photolithography［J］. Science, 2009, 324(5929): 913～917

[5] [5] Trisha L. Andrew, Hsin-Yu Tsai, Rajesh Menon. Confining light to deep subwavelength dimensions to enable optical nanopatterning［J］. Science, 2009, 324(5929): 917～921

[6] [6] Rajesh Menon. Absorbance-modulation optical lithography［J］. J. Opt. Soc. Am. A, 2006, 23(9): 2290～2294

[7] [7] Rajesh Menon, Hsin-Yu Tsai, Samuel W. Thomas III. Far-field generation of localized light fields using absorbance modulation［J］. Phys. Rev. Lett., 2007, 98: 043905

[8] [8] Niu Yongping. Design, Synthesis and NLO Properties of Novel Azobenzene Polymers and Porphyrin Polymers［D］. Sun Yat-sen University, 2004

[9] [9] Wang Guangbin, Hou Lisong, Gan Fuxi. Optical recording performance of novel heterocyclic azo dye-doped polymer (PMMA) thin film［J］. Chinese J. Lasers, 2000, 27(3): 264～268

[10] [10] Luo Yangcheng, She Weilong, Wu Shuizhu et al.. One-dimensional spatial distribution of photo-induced birefringence of azobenzene dye-doped polymers［J］. Chinese J. Lasers, 2005, 32(3): 370～374