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Acta Optica Sinica, Volume. 18, Issue 6, 675(1998)

Laser Plasma Soft X-Ray Source with Cryogenic Target

[in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]2, and [in Chinese]1
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  • 1[in Chinese]
  • 2[in Chinese]
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    References(2)

    [1] [1] Frits Zernike, David TAttwood (eds.). OSA Proceedings on Extreme Ultraviolet Lithography. Optical Society America, 1994. 23

    [2] [2] A. M. Hawryluk, N. M. Ceglio. Wavelength considerations in soft-X-ray projection lithography. Appl. Opt., 1993, 32(34): 1669～1672

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Laser Plasma Soft X-Ray Source with Cryogenic Target[J]. Acta Optica Sinica, 1998, 18(6): 675

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    Paper Information

    Category: Lasers and Laser Optics

    Received: Jun. 1, 1997

    Accepted: --

    Published Online: Oct. 18, 2006

    The Author Email:

    DOI:

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology