Micro-nano optical devices can realize multi-dimensional accurate manipulation of spatial light fields. Their advantages such as high resolution, small volume, short operating distance, and high integration overcome the limitations of traditional optical refractor devices, which have broad application prospects. However, with the continuous improvement of market demand indicators, the manufacturing contradiction between the micro-/nano-level feature size becomes more prominent, especially when the size of micro-nano optical devices is extended to exceed the millimeter level. This necessitates more stringent large-area and high-precision requirements for micro-nano fabrication technologies. In response to this challenge, this paper introduces in detail the application of lithography to micro-nano optical device fabrication and reviews the development history of different lithography technologies including ultraviolet projection, proximity, holographic mask, nanoimprint, laser direct writing, electron beam direct writing, and focused ion beam direct writing. The principles of the writing and technological evolution process are subsequently described. Additionally, the advantages and disadvantages of various lithography technologies and key technical problems are discussed. The prospect of using lithography technology to optimize the preparation of large-sized micro-nano optical devices with extreme precision requirements will further be explored in the future.