Chinese Optics Letters, Volume. 10, Issue s2, S21403(2012)
Feature width miniaturization in atom nanolithography with double standing wave layers
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Pingping Zhang, Yan Ma, Tongbao Li, "Feature width miniaturization in atom nanolithography with double standing wave layers," Chin. Opt. Lett. 10, S21403 (2012)
Category: Lasers and Laser Optics
Received: Apr. 3, 2012
Accepted: Jun. 26, 2012
Published Online: Dec. 6, 2012
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