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Chinese Journal of Lasers, Volume. 37, Issue 8, 2139(2010)

Si Microstructure Fabricated by 355 nm Nanosecond Pulsed Laser and Its Fluorescence Microscopy Study

[in Chinese]1、*, [in Chinese]2, [in Chinese]1, [in Chinese]1, [in Chinese]1, and Peter Zeppenfeld2
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], Peter Zeppenfeld. Si Microstructure Fabricated by 355 nm Nanosecond Pulsed Laser and Its Fluorescence Microscopy Study[J]. Chinese Journal of Lasers, 2010, 37(8): 2139

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    Paper Information

    Category: laser manufacturing

    Received: Oct. 14, 2009

    Accepted: --

    Published Online: Aug. 13, 2010

    The Author Email: (chunyangliu@tju.edu.cn)

    DOI:10.3788/cjl20103708.2139

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology