Researching | Self-aligned dual-beam superresolution laser direct writing with a polarization-engineered depletion beam

Photonics Research, Volume. 12, Issue 6, 1194(2024)

Self-aligned dual-beam superresolution laser direct writing with a polarization-engineered depletion beam

Guoliang Chen¹, Dewei Mo¹, Jian Chen^1,2,3,4, and Qiwen Zhan^1,2,3、*

Author Affiliations

¹School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China

²Shanghai Key Laboratory of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China

³Zhangjiang Laboratory, Shanghai 201204, China

⁴e-mail: cj@usst.edu.cn

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References(25)

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Guoliang Chen, Dewei Mo, Jian Chen, Qiwen Zhan, "Self-aligned dual-beam superresolution laser direct writing with a polarization-engineered depletion beam," Photonics Res. 12, 1194 (2024)

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Paper Information

Category: Nanophotonics and Photonic Crystals

Received: Jan. 12, 2024

Accepted: Mar. 25, 2024

Published Online: May. 24, 2024

The Author Email: Qiwen Zhan (qwzhan@usst.edu.cn)

DOI:10.1364/PRJ.518734

Topics

laser devices and laser physics

Lasers and Laser Optics

laser manufacturing

Instrumentation, Measurement and Metrology