Chinese Optics Letters, Volume. 11, Issue s1, S10209(2013)
Modelling and optimization of f ilm thickness variation for plasma enhanced chemical vapour deposition processes
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Xiuhua Fu, Lin Li, Gibson Des, Waddell Ewan, Wingo Lv, "Modelling and optimization of f ilm thickness variation for plasma enhanced chemical vapour deposition processes," Chin. Opt. Lett. 11, S10209 (2013)
Category: Deposition and process control
Received: Jan. 7, 2013
Accepted: Jan. 27, 2013
Published Online: May. 30, 2013
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