[2] [2] Stearns D G, Rosen R S, Vernon S P. Multilayer mirror technology for soft X-ray projection lithography. Appl. Opt., 1993, 32(34):6952～6960

[3] [3] Skulina K M, Alford C S, Bionta R M et al.. Molybdenum/beryllium multilayer mirrors for normal incidence in the extreme ultraviolet. Appl. Opt., 1995, 34(19):3727～3730

[4] [4] Sweeney D W, Hudyma R, Chapman H N et al.. EUV optical design for a 100 nm CD imaging system. Proc. SPIE, 1998, 3331:2～10

[5] [5] Kinoshita H, Watanable T, Niibe M et al.. Three-aspherical system for EUVL lithography. Proc. SPIE, 1998, 3331:20～30

[6] [6] Tichenor D A, Kubiak G D, Haney S J et al.. Recent results in the development of an integrated EUVL laboratory toll. Proc. SPIE, 1995, 2437:292～307