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Acta Optica Sinica, Volume. 35, Issue 8, 822006(2015)

Simulation Model of Mask with Defect and Its Application to Defect Compensation in Extreme-Ultraviolet Lithography

Liu Xiaolei1,2、*, Wang Xiangzhao1,2, and Li Sikun1,2
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    Article index updated: Mar. 10, 2025

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    Liu Xiaolei, Wang Xiangzhao, Li Sikun. Simulation Model of Mask with Defect and Its Application to Defect Compensation in Extreme-Ultraviolet Lithography[J]. Acta Optica Sinica, 2015, 35(8): 822006

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Mar. 6, 2015

    Accepted: --

    Published Online: Jul. 29, 2015

    The Author Email: Xiaolei Liu (liuxl@siom.ac.cn)

    DOI:10.3788/aos201535.0822006

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology