Fig. 1. Fabrication steps of the dynamic metasurface with a large area. (a) The AAO template with PMMA support. (b) The dissolution of the PMMA using acetone. (c) The transfer of the AAO by a new substrate. (d) The Si deposition using electron beam evaporation. (e) The detachment of the AAO with adhesive tape. (f) The Si metasurface with a large area. (g) The PDMS coating and curing. (h) The sacrificial layer dissolution in 20% HCl. (i) The Si metasurface embedded in the PDMS.

Fig. 2. (a) The SEM image of the AAO template with a 45° tilt view. (b) The SEM image of the Si metasurface with the top view. (c) The SEM image of the Si metasurface with a 45° tilt view. (d) The SEM image of the Si metasurface with a large area. (e) The photograph of the metasurface embedded in the PDMS. (f) The histogram of the diameter distribution.

Fig. 3. (a) The schematic of the optical setup used to measure the metasurface. (b) The measured (red line) and simulated (blue line) transmission spectra of the Si metasurface embedded in the PDMS without any strain. (c) The electric field of the MD at λ = 646 nm. (d) The magnetic field of the MD at λ = 646 nm. (e) The electric field of the ED at λ = 733 nm. (f) The magnetic field of the ED at λ = 733 nm. The direction of the field is shown by arrows, and the strength of the field is indicated by the color.

Fig. 4. (a) The sketch of the Si metasurface embedded in the PDMS. (b) The sketch of the metasurface immersed in toluene. (c) The measured transmittance of the metasurface after immersion in the toluene with different concentrations. Red, magenta, and orange correspond to concentrations of 0%, 10%, and 20%, respectively. (d) The simulated transmittance of the metasurface with the corresponding stretch ratio. Blue, green, and cyan correspond to the stretch ratios of 100%, 113%, and 122%, respectively.