Laser & Optoelectronics Progress, Volume. 59, Issue 1, 0114013(2022)
Influence of Optical Element Heat Absorption on Focus Position of Equipment in Semiconductor Laser Processing
Fig. 5. Deposition power. (a) Deposition power of the lens; (b) deposition power on target surface
Fig. 7. Relationship between RMS of point size and position of focal plane. (a) Overall change curves; (b) enlargement in Fig. 7(a)
Fig. 9. Experimental device. (a) Ultraviolet laser processing equipment; (b) ultraviolet laser instrument; (c) processing platform
Fig. 10. Change of focusing spot. (a) Light spot at initial position; (b) stabilized light spot
Fig. 11. Morphologies of cutting areas. (a) Initial cutting area; (b) transition area; (c) initial stable area; (d) ending stable area
Fig. 12. Measurement results of step profiler. (a) Measuring position of step profiler; (b) step morphology
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Zhichao Dong, Ting Liang, Cheng Lei, Kaixun Gong, Xuezhan Wu, Lei Qi. Influence of Optical Element Heat Absorption on Focus Position of Equipment in Semiconductor Laser Processing[J]. Laser & Optoelectronics Progress, 2022, 59(1): 0114013
Category: Lasers and Laser Optics
Received: Jul. 30, 2021
Accepted: Sep. 8, 2021
Published Online: Dec. 23, 2021
The Author Email: Ting Liang (liangtingnuc@163.com)