[1] [1] M. Reichling, A. Bodemann, N. Kaiser. Defect induced laser damage in oxide multilayer coatings for 248 nm [J]. Thin Solid Film, 1998, 320(2):264～279

[2] [2] N. Kaiser, H. Uhlig, U. B. Schallenberg et al.. High damage threshold Al2O3/SiO2 dielectric coatings for excimer lasers [J]. Thin Solid Film, 1995, 260(1):86～92

[3] [3] K. Yoshida, M. Ohya, K. Hatooka et al.. Optical properties of porous fluoride coatings for UV and deep UV lasers[C]. SPIE, 2002, 4679:429～434

[4] [4] T. Izawa, N. Yamamura, R. Uchimura et al.. Damage threshold of fluoride HR coatings at 352 nm [C]. SPIE, 1992, 1848:322～329

[5] [5] E. Eva, K. Mann, N. Kaise et al.. Laser conditioning of LaF3/MgF2 dielectric coatings at 248 nm [J]. Appl. Opt., 1996, 35(28):5613～5619

[6] [6] E. T. Hutcheson, G. Hass, J. T. Cox. Effect of deposition rate and substrate temperature on the vacuum ultraviolet reflectance of MgF2- and LiF-overcoated aluminum mirrors [J]. Appl. Opt., 1972, 11(10):2245～2248

[9] [9] R. B. Sargent. Effects of surface diffusion on thin-film morphology: a computer study [C]. SPIE, 1990, 1324:13～31

[10] [10] George Atanassov, James Turlo, Ji Kai Fu et al.. Mechanical, optical, and structural properties of TiO2 and MgF2 thin films deposited by plasma ion assisted deposition [J]. Thin Solid Films, 1999, 342:83～92

[11] [11] D. G. McCulloch, A. R. Merchant. The effect of annealing on the structure of cathodic arc deposited amorphous carbon nitride films [J]. Thin Solid Films, 1996, 290-291:99～102

[12] [12] Cheng Chung Lee, Ming Chung Liu, Masaaki Kaneko et al.. Characterization of AlF3 thin films at 193 nm by thermal evaporation [J]. Appl. Opt., 2005, 44(34):7333～7338

[13] [13] T. K. Song, J. Kim, S. I. Kwun. Size effects on the quantum paraelectric SrTiO3 nanocrystals [J]. Solid State Commun., 1996, 97(2):143～147

[14] [14] Joseph F. Hall, Jr., W. F. C. Ferguson. Optical properties of cadmium sulfide and zinc sulfide from 0.6 micron to 14 microns [J]. J. Opt. Soc. Am., 1955, 45(9):714～718

[15] [15] J. C. Manifacier, J. Gasiot, J. P. Fillard. A simple method for the determination of the optical constant n,k and the thickness of a weakly absorbing thin film[J]. J. Phys. E: Sci. Instrum., 1976, 9(11):1002～1004

[17] [17] ISO 11254-1:2000, Lasers and laser-related equipment-determination of Laser-induced Damage Threshold of Optical Surfaces. Part 1: 1-on-1 test, International Organization for Standardization, Geneva, Switzerland, 2000

[18] [18] Laser-induced damage threshold and certification procedure for optical materials, NASA Reference Publication 1395, June 1997