Chinese Optics, Volume. 18, Issue 1, 186(2025)

Effect of GaInP and GaAsP inserted into waveguide/barrier interface on carrier leakage in InAlGaAs quantum well 808-nm laser diode

Meng-jie FU1, Hai-liang DONG1,2、*, Zhi-gang JIA1, Wei JIA1,2, Jian LIANG3, and Bing-she XU1,2,4、*
Author Affiliations
  • 1Key Laboratory of Interface Science and Engineering in Advanced Materials, Ministry of Education, Taiyuan University of Technology, Taiyuan 030024, China
  • 2Shanxi-Zheda Institute of Advanced Materials and Chemical Engineering, Taiyuan 030024, China
  • 3College of Materials Science and Engineering, Taiyuan University of Technology, Taiyuan 030024, China
  • 4Institute of Atomic and Molecular Science, Shaanxi University of Science & Technology, Xi’an 710021, China
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    Figures & Tables(8)
    Diagram of three LDs’ epitaxial structures
    (a) Refractive index and TE mode optic field intensity distributions of three LDs; (b) magnified diagrams in the range of 1750−1900 nm for LD1, LD2, and LD3
    Curves of (a) quantum well external loss (αOut), (b) quantum well internal loss (αQW), and (c) total optical loss (αTotal) of three LDs as a function of injection current
    (a) The energy band comparison of the LDs with three structures at an injection current of 10 A and (b) the magnification of LD1, LD2, and LD3 in the 1760−1860 nm range
    (a) Leakage current density, (b) auger recombination current density, (c) SRH recombination current density, and (d) nonradiative recombination current density of three LDs as a function of injection current
    (a) Threshold current of three LDs; (b) operating voltage, (c) output power and (d) WPE of three LDs as a function of injection current
    (a) Fitted curves of wavelength and (b) threshold current of three LDs as a function of temperature
    • Table 1. Parameters of 808-nm LD’s epitaxial structures

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      Table 1. Parameters of 808-nm LD’s epitaxial structures

      Structure layerMaterialsThicknesses /nmDoping concentration /cm−3
      p-Contact layerGaAs3501×1019
      p-Cladding layerAl0.55Ga0.45As10001×1019
      p-Waveguide layerAl0.35-0.55Ga0.65-0.45As3001×1017~1×1018
      p-Insertion layerGa0.55In0.45P/GaAs0.6P0.481×1017
      p-Barrier layerAl0.2Ga0.8As60
      Quantum wellIn0.14Al0.16Ga0.7As50
      n-Barrier layerAl0.2Ga0.8As60
      n-Insertion layerGa0.55In0.45P81×1017
      n-Waveguide layerAl0.35-0.55Ga0.65-0.45As6001×1017~1×1018
      n-Cladding layerAl0.55Ga0.45As12001×1019
      n-SubstrateGaAs20001×1019
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    Meng-jie FU, Hai-liang DONG, Zhi-gang JIA, Wei JIA, Jian LIANG, Bing-she XU. Effect of GaInP and GaAsP inserted into waveguide/barrier interface on carrier leakage in InAlGaAs quantum well 808-nm laser diode[J]. Chinese Optics, 2025, 18(1): 186

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    Paper Information

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    Received: Feb. 27, 2024

    Accepted: May. 6, 2024

    Published Online: Mar. 14, 2025

    The Author Email: Hai-liang DONG (dhltyut@163.com), Bing-she XU (xubs@tyut.edu.cn)

    DOI:10.37188/CO.EN-2024-0006

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