Effect of 355 nm and 1064 nm dual-wavelength conditioning on the bulk damage properties of DKDP crystal

Yunfei Li; Jinfang Shi; Rong Qiu; Jian Yu; Decheng Guo; Lei Zhou

doi:10.11884/HPLPB202234.220060

High Power Laser and Particle Beams, Volume. 34, Issue 6, 061003(2022)

Effect of 355 nm and 1064 nm dual-wavelength conditioning on the bulk damage properties of DKDP crystal

Yunfei Li^1,2, Jinfang Shi^1,2、*, Rong Qiu², Jian Yu^1,2, Decheng Guo², and Lei Zhou²

¹School of Manufacturing Science and Engineering, Key Laboratory of Testing Technology for Manufacturing Process of Ministry of Education, Southwest University of Science and Technology, Mianyang 621010, China

²Joint Laboratory for Extreme Conditions Matter Properties, Southwest University of Science and Technology, Mianyang 621010, China

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Figures & Tables(7)

Fig. 1. Experimental system diagram of dual-wavelength conditioning and damage test

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Fig. 2. DKDP crystal material

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Fig. 3. The effect of dual-wavelength conditioning with different energy density combinations on the 3ω damage probability of DKDP crystal

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Fig. 4. Typical bulk damage pinpoint morphologies under different laser conditioning

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Table 1. Dual-wavelength conditioning parameters

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Table 1. Dual-wavelength conditioning parameters

group A	fluence/(J·cm⁻²)		group B	fluence/(J·cm⁻²)
group A	1ω	3ω	group B	1ω	3ω
A1	0	7.4, 9.2, 11.0, 12.8, 14.6	B1	0	7.4, 9.2, 11.0
A2	2.6	7.4, 9.2, 11.0, 12.8, 14.6	B2	7.9	7.4, 9.2, 11.0
A3	5.3	7.4, 9.2, 11.0, 12.8, 14.6	B3	10.6	7.4, 9.2, 11.0
A4	7.9	7.4, 9.2, 11.0, 12.8, 14.6	B4	15.9	7.4, 9.2, 11.0
A5	10.6	7.4, 9.2, 11.0, 12.8, 14.6	—	—	—

Table 2. Maximum zero probability damage threshold and average damage pinpoints density of 3ω under different pre-exposure methods

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Table 2. Maximum zero probability damage threshold and average damage pinpoints density of 3ω under different pre-exposure methods

group	area	initial bulk damage threshold/(J·cm⁻²)	percentage/%	mean pinpoints density/mm³(3ω, about 33.6 J/cm²)
without conditioning	—	13.7	0	25
A	A1	16.6	21.2	10
	A2	18.2	32.8	8
	A3	18.8	37.2	4
	A4	19.9	45.3	1
B	B1	16.3	19.1	18
	B2	19.3	40.9	4
	B3	18.3	33.6	5
	B4	17.5	27.7	11

Table 3. Relationship between conditioning parameters and b

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Table 3. Relationship between conditioning parameters and b

area		conditioning methods	1ω energy density/(J·cm⁻²)	b
		without pre-exposure	—	−13.752
A	A1	3ω	0	−16.664
	A2	3ω+1ω	2.6	−18.062
	A3		5.3	−18.934
	A4		7.9	−19.844
B	B1	3ω	0	−16.001
	B2	3ω+1ω	7.9	−19.140
	B3		10.6	−18.196
	B4		15.9	−17.291

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Yunfei Li, Jinfang Shi, Rong Qiu, Jian Yu, Decheng Guo, Lei Zhou. Effect of 355 nm and 1064 nm dual-wavelength conditioning on the bulk damage properties of DKDP crystal[J]. High Power Laser and Particle Beams, 2022, 34(6): 061003

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Paper Information

Category: High Power Laser Physics and Technology

Received: Mar. 3, 2022

Accepted: Apr. 26, 2022

Published Online: Jun. 2, 2022

The Author Email: Jinfang Shi (603071939@qq.com)

DOI:10.11884/HPLPB202234.220060

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology