Chinese Optics, Volume. 17, Issue 5, 1150(2024)
Process adaptability for digital grating-based focusing and leveling sensors
Fig. 2. (a) Preservation and (b) removal of optical grating image by digital grating
Fig. 6. Displacement out of sync between the wafer surface pattern imaging and the optical grating imaging
Fig. 7. Schematic diagram of the optical grating image on the CMOS pixel array
Fig. 9. The accumulated light intensity in one digital grating period before calibration
Fig. 10. The accumulated light intensity in one digital grating period with patterns on the surface of the water
Fig. 12. Statistics of the distribution interval of
Fig. 13. Corrected accumulated light intensity curve (in one digital grating period)
Fig. 15. Light intensity curves, alignment points and their enlarged views before and after correction
Fig. 16. The corresponding optical grating image when 4 patterns appear on the wafer surface
Fig. 17. The light intensity
Fig. 18. Mean square error of fitting corresponding intensity
Fig. 19. Testing platform of focusing and leveling sensor based on digital grating
Fig. 21. Displacement values measured by the digital grating during stepping
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Hai-feng ZENG, Shi-guang LI, Xian-jie LI. Process adaptability for digital grating-based focusing and leveling sensors[J]. Chinese Optics, 2024, 17(5): 1150
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Received: Jan. 25, 2024
Accepted: Mar. 25, 2024
Published Online: Dec. 31, 2024
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