Chinese Optics, Volume. 17, Issue 5, 1150(2024)

Process adaptability for digital grating-based focusing and leveling sensors

Hai-feng ZENG1,2,3, Shi-guang LI1,2,3、*, and Xian-jie LI3
Author Affiliations
  • 1Institute of Microelectronics of the Chinese Academy of Sciences, Beijing 100029, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
  • 3Jiangsu Yingsu Integrated Circuit Equipment Co., Ltd, Wuxi 214142, China
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    Figures & Tables(24)
    Optical grating image on CMOS pixel array
    (a) Preservation and (b) removal of optical grating image by digital grating
    Light intensity curves I1 and I2
    Normalized I curves
    Focusing and leveling sensor based on digital grating
    Displacement out of sync between the wafer surface pattern imaging and the optical grating imaging
    Schematic diagram of the optical grating image on the CMOS pixel array
    Schematic diagram of grating image segmentation
    The accumulated light intensity in one digital grating period before calibration
    The accumulated light intensity in one digital grating period with patterns on the surface of the water
    The accumulated light intensity after calibration
    Statistics of the distribution interval of M accumulated light intensity values
    Corrected accumulated light intensity curve (in one digital grating period)
    Flowchart of the image correction method
    Light intensity curves, alignment points and their enlarged views before and after correction
    The corresponding optical grating image when 4 patterns appear on the wafer surface
    The light intensity I curves for different wafer surfaces during the Z-axis from 0 μm to 40 μm, where the black curves are the light intensity curves when the surface is clean, the red curves are for the pattern existing on the surface, and the blue ones are the corrected light intensity curves (a,b,c,d represent circular pattern, lines, scratches, and dust respectively)
    Mean square error of fitting corresponding intensity I curves for different wafer surfaces during Z direction stepping. (a) Circular pattern, (b) lines, (c) scratch, (d) dust
    Testing platform of focusing and leveling sensor based on digital grating
    Optical grating images before and after Z-axis stepping
    Displacement values measured by the digital grating during stepping
    The movement value of the alignment point
    The error before and after correction of the algorithm
    • Table 1. Analogical to digital gratings and vernier calipers

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      Table 1. Analogical to digital gratings and vernier calipers

      数字光栅游标卡尺
      主尺相机的像素阵列机械主尺
      游标尺周期性光栅像机械游标尺
      原理利用周期差对微小位移进行“放大”
      方法求解光强曲线零点找刻度对准点读数
      分辨率高于周期差两尺的周期差
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    Hai-feng ZENG, Shi-guang LI, Xian-jie LI. Process adaptability for digital grating-based focusing and leveling sensors[J]. Chinese Optics, 2024, 17(5): 1150

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    Paper Information

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    Received: Jan. 25, 2024

    Accepted: Mar. 25, 2024

    Published Online: Dec. 31, 2024

    The Author Email:

    DOI:10.37188/CO.2024-0021

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