Opto-Electronic Engineering, Volume. 31, Issue 3, 41(2004)

Experimental study for ion beam sputtering deposition of Ta2O5 optical thin film

[in Chinese], [in Chinese], [in Chinese], and [in Chinese]
Author Affiliations
  • [in Chinese]
  • show less
    References(4)

    [1] [1] AI-JUMAILY G A,EDLOU S M.Optical properties of tantalum pentoxide coatings deposited using ion beam processes[J].Thin Solid Film,1992,209(2):223-229.

    [2] [2] WEI D T.Ion beam interference coating for ultralow optical loss[J].Appl.Opt,1989,28(14):2813-2816.

    [3] [3] ZHANG Yun-dong,LIU Hong-xiang.Ion beam sputter deposition technique for the production of optical coatings[J].Opto-Electronic Engineering,2001,28(5):69-72.(in Chinese).

    [4] [4] HENKING R,RISTAU D,ALVENSLEBEN F V,et al .Optical characteristics and damage threshold of low mirrors[J].SPIE,1995,2428:281-292.

    CLP Journals

    [1] LI Ding, LI Qian-tao, XIONG Chang-xin. Changing Rules of Deposition Rate with Time in Ion Beam Sputtering System[J]. OPTICS & OPTOELECTRONIC TECHNOLOGY, 2020, 18(6): 86

    Tools

    Get Citation

    Copy Citation Text

    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Experimental study for ion beam sputtering deposition of Ta2O5 optical thin film[J]. Opto-Electronic Engineering, 2004, 31(3): 41

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category:

    Received: Oct. 20, 2003

    Accepted: --

    Published Online: Nov. 14, 2007

    The Author Email:

    DOI:

    Topics