Optoelectronic Technology, Volume. 42, Issue 1, 47(2022)
Analysis and Improvement of Stripe Mura in TFT‑LCD
Fig. 8. Mechanism analysis diagram of backside exposure technology process
Fig. 9. Schematics of measurement of contact angle and measurement of static electricity
Fig. 10. Results of measurement of contact angle and measurement of static electricity
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Zhenglin ZHANG, Shuhui CAO, Yan WANG, Chen LYU, Zhenyu FENG. Analysis and Improvement of Stripe Mura in TFT‑LCD[J]. Optoelectronic Technology, 2022, 42(1): 47
Category: Research and Trial-manufacture
Received: Jul. 25, 2021
Accepted: --
Published Online: Aug. 3, 2022
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