Optical Instruments, Volume. 46, Issue 4, 81(2024)

Ensuring the yield of mass production in extreme ultraviolet lithography: the pellicle for mask

Xiaoran LI* and Fenghua LI
Author Affiliations
  • Laboratory of Thin Film Optics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
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    Figures & Tables(19)
    Function of the EUV pellicle
    Optical constants at 13.5 nm for typical elements[9]
    Example of grid supported EUV pellicle structure[4]
    Process flow of SiNx pellicle with self-assembled 3D patterns(right), and scanning electron microscopy(SEM)images on the initial and etched pellicles(left)[16]
    Factors in the optical model for transmission and scattering of carbon nanotube pellicle[24]
    Fabrication processes for EUV pellicles based on SiNx[18]
    Synthesis of graphene/graphite on copper/nickel catalysts, by using CVD[19,33]
    NGF growth on the Ni film/Ni foil
    Wet and dry transfer process for the free-standing NGF[5]
    An unusual transfer process utilizing camphor as a supporting layer instead of PMMA[34]
    SEM images of different CNT pellicle structures[22]
    Schematic diagram of an experimental setup for the purification of CNT film[40]
    CNT pellicle films supported by different types of external frames[41]
    Morphology and crystal properties of carbon-based pellicle films
    Optical properties of carbon nanotube pellicles
    “Bulge tester” to measure the mechanical properties of the pellicle
    The influence of hydrogen plasma for different types of pellicles[20]
    • Table 1. Advantages and disadvantages of main types of pellicle film materials

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      Table 1. Advantages and disadvantages of main types of pellicle film materials

      Pellicle materialAdvantagesDisadvantages
      Si based filmGood chemical stability[9]Mature preparation process[18]Low EUV transmission[16]Poor thermal resistance[4]Low Young's modulus[8]
      Carbon based filmHigh transmission[24]High Young’s modulus[25]High thermal resistance[20]Poor H+ durability[20]EUV scattering effect[24]
    • Table 2. Preparation processes for typical types of pellicle films

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      Table 2. Preparation processes for typical types of pellicle films

      Pellicle film typeGrowth methodTransfer methodReferences
      SiNxCVDwet and dry[18]
      Graphite/GrapheneCVDwet and dry; "camphor" transfer[5][34]
      CNTCVDdry transfer;liquid phase filtration[39,40][41]
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    Xiaoran LI, Fenghua LI. Ensuring the yield of mass production in extreme ultraviolet lithography: the pellicle for mask[J]. Optical Instruments, 2024, 46(4): 81

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    Paper Information

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    Received: Mar. 12, 2024

    Accepted: --

    Published Online: Nov. 14, 2024

    The Author Email: LI Xiaoran (w16a2z@163.com)

    DOI:10.3969/j.issn.1005-5630.202403110048

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