Optical Instruments, Volume. 46, Issue 4, 81(2024)
Ensuring the yield of mass production in extreme ultraviolet lithography: the pellicle for mask
Fig. 4. Process flow of SiNx pellicle with self-assembled 3D patterns(right), and scanning electron microscopy(SEM)images on the initial and etched pellicles(left)[16]
Fig. 5. Factors in the optical model for transmission and scattering of carbon nanotube pellicle[24]
Fig. 10. An unusual transfer process utilizing camphor as a supporting layer instead of PMMA[34]
Fig. 12. Schematic diagram of an experimental setup for the purification of CNT film[40]
Fig. 13. CNT pellicle films supported by different types of external frames[41]
Fig. 14. Morphology and crystal properties of carbon-based pellicle films
Fig. 16. “Bulge tester” to measure the mechanical properties of the pellicle
Fig. 17. The influence of hydrogen plasma for different types of pellicles[20]
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Xiaoran LI, Fenghua LI. Ensuring the yield of mass production in extreme ultraviolet lithography: the pellicle for mask[J]. Optical Instruments, 2024, 46(4): 81
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Received: Mar. 12, 2024
Accepted: --
Published Online: Nov. 14, 2024
The Author Email: LI Xiaoran (w16a2z@163.com)