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Journal of Synthetic Crystals, Volume. 52, Issue 6, 1110(2023)

Effect of Heat Shield Structure on the Distribution of Oxygen Content in 200 mm Semiconductor-Grade Czochralski Monocrystalline Silicon

RUI Yang1, WANG Zhongbao1, SHENG Wang2, NI Haoran1, XIONG Huan1, ZOU Qipeng2,3, CHEN Weinan2,3, HUANG Liuqing2,3, and LUO Xuetao2,3
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  • 1[in Chinese]
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    RUI Yang, WANG Zhongbao, SHENG Wang, NI Haoran, XIONG Huan, ZOU Qipeng, CHEN Weinan, HUANG Liuqing, LUO Xuetao. Effect of Heat Shield Structure on the Distribution of Oxygen Content in 200 mm Semiconductor-Grade Czochralski Monocrystalline Silicon[J]. Journal of Synthetic Crystals, 2023, 52(6): 1110

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    Received: Feb. 2, 2023

    Accepted: --

    Published Online: Aug. 13, 2023

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    DOI:

    CSTR:32186.14.

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology