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Chinese Journal of Lasers, Volume. 29, Issue s1, 418(2002)

Research on the Photoresist Action in Fabrication of Binary Optical Elements

KONG Ling-bin1,2, YI Xin-jian1, WANG Dian-hong2, CHEN Si-hai1, and HUANG Guang3
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  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    The photoresist is very important in fabrication of Binary Optical Elements (BOE). In this paper, different photoresist are used and compared in the photolithography and etching process of fabricating BOE. By adjusting the type of photoresist according to various patterns, BOE with good performance have been accomplished.

    Keywords
    binary opticsetchingphotolithographyphotoresist
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    KONG Ling-bin, YI Xin-jian, WANG Dian-hong, CHEN Si-hai, HUANG Guang. Research on the Photoresist Action in Fabrication of Binary Optical Elements[J]. Chinese Journal of Lasers, 2002, 29(s1): 418

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    Paper Information

    Category: laser devices and laser physics

    Received: --

    Accepted: --

    Published Online: Feb. 23, 2013

    The Author Email:

    DOI:

    CSTR:32186.14.

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology