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Chinese Journal of Lasers, Volume. 39, Issue s2, 208002(2012)

Aspherical Null Testing System for Extreme Ultraviolet Lithography Mirrors

Wang Liping* and Zhang Haitao
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    Article index updated: Mar. 10, 2025

    The article is cited by 1 article(s) CLP online library. (Some content might be in Chinese.)
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    Wang Liping, Zhang Haitao. Aspherical Null Testing System for Extreme Ultraviolet Lithography Mirrors[J]. Chinese Journal of Lasers, 2012, 39(s2): 208002

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    Paper Information

    Category: Measurement and metrology

    Received: Jun. 10, 2012

    Accepted: --

    Published Online: Dec. 24, 2012

    The Author Email: Liping Wang (wlp8121@126.com)

    DOI:10.3788/cjl201239.s208002

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology