Fig. 1. Flowchart of solving TTM-MD model

Fig. 2. Schematic diagram of TTM-MD theoretical model

Fig. 3. Time-dependent variation with surface electron and lattice temperatures of aluminum film under femtosecond laser (pulse width of 100 fs and pulse wavelength of 800 nm) irradiation with different laser fluences. (a) 0.66 J/cm²; (b) 0.68 J/cm²; (c) 0.70 J/cm²

Fig. 4. Movement of surface atom of aluminum film under femtosecond laser (pulse width of 100 fs and pulse wavelength of 800 nm) irradiation with different laser fluences. (a) 0.66 J/cm²; (b) 0.68 J/cm²; (c) 0.70 J/cm²

Fig. 5. Contour plots of temperature and pressure of aluminum film with 200 nm thickness under femtosecond laser (pulse width of 100 fs and pulse wavelength of 800 nm) irradiation at laser fluence of 0.70 J/cm². (a) Temperature contour plot; (b) pressure contour plot

Fig. 6. Variation curves of electron and lattice temperatures on surface of aluminum film with time when N_p is different. (a) N_p=1;

Fig. 7. Contour plots of electron and lattice temperatures of aluminum film. (a)(b) Electron temperature; (c)(d) lattice temperature

Fig. 8. CNA distribution of aluminum film of femtosecond laser (pulse width of 100 fs and pulse wavelength of 800 nm) in pulse train processing mode with different N_p

Fig. 9. Contour plots of temperature and pressure of aluminum film with 200 nm thickness under femtosecond laser (pulse width of 100 fs and pulse wavelength of 800 nm) irradiation at fluence of 0.14 J/cm² with N_p of 4. (a) Temperature contour plot; (b) pressure contour plot

Fig. 10. Movement of surface atom of aluminum film when femtosecond laser with pulse width of 100 fs, wavelength of 800 nm, laser fluence of 0.14 J/cm², and N_p of 4 is irradiated in pulse train processing mode