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Acta Optica Sinica, Volume. 9, Issue 10, 871(1989)

Discharge characteristics of XeCl excimer laser with high repetition rate

Wang Husheng, Ni Jinzhi, Wang Jianye, Li Guangyin, and Yu Yinshan
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    Wang Husheng, Ni Jinzhi, Wang Jianye, Li Guangyin, Yu Yinshan. Discharge characteristics of XeCl excimer laser with high repetition rate[J]. Acta Optica Sinica, 1989, 9(10): 871

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    Paper Information

    Category: Lasers and Laser Optics

    Received: Jan. 4, 1989

    Accepted: --

    Published Online: Aug. 24, 2020

    The Author Email:

    DOI:

    CSTR:32186.14.

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology