Chinese Optics, Volume. 16, Issue 5, 1177(2023)
Method for the simultaneous measurement of waveguide propagation loss and bending loss
Fig. 1. Process flow of LN waveguide fabrication. (a) LNOI substrate. (b) Deposition of oxide by PECVD. (c) I-line lithography. (d) Hard mask etching. (e) LN etching. (f) Photoresist removal. (g) Hard mask removal. (h) Deposition of cladding by PECVD
Fig. 4. Layout image of the 5 sets of cutback structures for the 5 splits of the grating coupler
Fig. 5. (a) Simulation of the bending loss of the LN waveguide. The bending loss of the waveguide is exponentially related to the bending radius. (b) The linear fitting of the natural logarithm of the bending loss with the bending radius
Fig. 7. The measurement results of the cut-back structure and the fitting results. (a) GC1, (b) GC2, (c) GC3, (d) GC4, (e) GC5-1, (f) GC5-2
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Zuo-wen FAN, Lian-xi JIA, Zhao-yi LI, Jing-jie ZHOU, Qing-yu CONG, Xian-feng ZENG. Method for the simultaneous measurement of waveguide propagation loss and bending loss[J]. Chinese Optics, 2023, 16(5): 1177
Category: Original Article
Received: Nov. 27, 2022
Accepted: --
Published Online: Oct. 27, 2023
The Author Email: Lian-xi JIA (jialx@mail.sim.ac.cn)