Laser & Optoelectronics Progress, Volume. 59, Issue 19, 1916004(2022)

Investigation of Spatter Characteristics in Selective Laser Melting Based on Maximum Entropy Threshold Segmentation Algorithm

Linjun Zhao1, Guoqing Zhang2,3、*, Dalin Zhang1, and Zhiwen Li4
Author Affiliations
  • 1College of Engineering and Technology, Nanchang Vocational University, Nanchang 330500, Jiangxi, China
  • 2Institute of Technological Sciences, Wuhan University, Wuhan 430072, Hubei, China
  • 3Shenzhen Research Institute, Wuhan University, Shenzhen 518057, Guangdong, China
  • 4School of Mechanical Engineering, Jiangxi Technical College of Manufacturing, Nanchang 330095, Jiangxi, China
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    Figures & Tables(9)
    Device for acquiring spatter images
    Spatter images at different laser powers. (a) P=100 W; (b) P=150 W; (c) P=200 W
    Spatter images processing process. (a) Morphological filtering; (b) maximum entropy thresholding segmentation; (c) molten pool interference removal; (d) spatter contour extraction
    Grayscale histogram of spatter images
    Molten pool interference removal. (a) P=100 W; (b) P=150 W; (c) P=200 W
    Spatters contour superimposed on original image. (a) P=100 W; (b) P=150 W; (c) P=200 W
    Statistics of spatter characteristics under different laser powers. (a) Total spatter area; (b) total spatter number; (c) distribution of total spatter number as a function of spatter area
    • Table 1. Main technical parameters of SLM in the experiment

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      Table 1. Main technical parameters of SLM in the experiment

      ItemWavelength /nmMax laser power /WFocus beam size /μmBuilding chamber /(mm×mm×mm)Scan speed /(mm·s-1
      Value109020070100×100×120400
    • Table 2. 316L stainless steel powder chemical compositions

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      Table 2. 316L stainless steel powder chemical compositions

      Chemical compositionCCrNiMoSiMnOFe
      Mass fraction /%0.0317.5312.062.160.860.380.1366.85
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    Linjun Zhao, Guoqing Zhang, Dalin Zhang, Zhiwen Li. Investigation of Spatter Characteristics in Selective Laser Melting Based on Maximum Entropy Threshold Segmentation Algorithm[J]. Laser & Optoelectronics Progress, 2022, 59(19): 1916004

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    Paper Information

    Category: Materials

    Received: Sep. 13, 2021

    Accepted: Oct. 8, 2021

    Published Online: Sep. 23, 2022

    The Author Email: Zhang Guoqing (guoqingzhang_1989@126.com)

    DOI:10.3788/LOP202259.1916004

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