Optoelectronic Technology, Volume. 42, Issue 1, 28(2022)

Design and Experiment on Low Level Charge to Voltage Factor Structure of CCD

Xiaodong WANG, Chaomin WANG, Jia LI, Ge TU, and Jin LI
Author Affiliations
  • Chongqing Optoelectronics Research Institute, Chongqing 400060, CHN
  • show less
    Figures & Tables(6)
    Ultraviolet linear CCD structure for process experiment
    Traditional output node CVF structure of CCD
    CVF structure of first design experiment
    CVF structure after optimization
    • Table 1. Designed and examined parameters of first design experiment

      View table
      View in Article

      Table 1. Designed and examined parameters of first design experiment

      第一级放大器MOS管宽度/μm第一级放大器MOS管长度/μm输出节点FD电容面积/μm2输出栅长/μm复位栅长/μm理论设计的CVF值/(μV/e-实际测试的CVF值/(μV/e-
      140181480120150.250.48
      90141480120150.300.55
      80101480120150.350.63
      7081480120150.40.71
      6071480120150.450.81
    • Table 2. Designed and examined parameters of optimized structure

      View table
      View in Article

      Table 2. Designed and examined parameters of optimized structure

      偏差比例因子输出节点FD电容面积/μm2第一级放大器MOS管宽度/μm第一级放大器MOS管长度/μmFD电容和MOS电容对总电容贡献占比理论设计的CVF/(μV/e-实际测试的CVF/(μV/e-
      0.923 050290180.062∶0.9380.250.266
      0.833 050260180.070∶0.9300.300.314
      0.803 050220180.079∶0.9210.350.352
      0.783 050190180.091∶0.9090.400.413
    Tools

    Get Citation

    Copy Citation Text

    Xiaodong WANG, Chaomin WANG, Jia LI, Ge TU, Jin LI. Design and Experiment on Low Level Charge to Voltage Factor Structure of CCD[J]. Optoelectronic Technology, 2022, 42(1): 28

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: Research and Trial-manufacture

    Received: Jul. 17, 2021

    Accepted: --

    Published Online: Aug. 3, 2022

    The Author Email:

    DOI:10.19453/j.cnki.1005-488x.2022.01.006

    Topics