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Chinese Optics, Volume. 13, Issue 1, 28(2020)

Research progress on laser-produced plasma light source for 13.5 nm extreme ultraviolet lithography

ZONG Nan1,2, HU Wei-min1,3, WANG Zhi-min1, WANG Xiao-jun1, ZHANG Shen-jin2, BO Yong1, PENG Qin-Jun1,2, and XU Zu-yan1,2
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    ZONG Nan, HU Wei-min, WANG Zhi-min, WANG Xiao-jun, ZHANG Shen-jin, BO Yong, PENG Qin-Jun, XU Zu-yan. Research progress on laser-produced plasma light source for 13.5 nm extreme ultraviolet lithography[J]. Chinese Optics, 2020, 13(1): 28

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    Received: Apr. 11, 2019

    Accepted: --

    Published Online: Mar. 9, 2020

    The Author Email:

    DOI:10.3788/co.20201301.0028

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