[1] [1] Paul Greupner, Reiner Garreis, Aksel Gehnermeier et al.. Impact of wavefront errors on low k1 processes at extremely high NA[C]. Proc. SPIE, 2003, 5040: 119～130

[2] [2] Joost Sytsma, Hans van der Laan, Marco Moers et al.. Improved imaging metrology needed for advanced lithography[J]. Semiconductor International, 2001

[4] [4] T. A. Brunner. Impact of lens aberrations on optical lithography[J]. IBM J. Res. Develop, 1997, 41(1): 57～67

[5] [5] J. J. Chen, C. M. Huang, F. J. Shiu et al.. Influence of coma effect on scanner overlay[C]. Proc. SPIE, 2002, 4689: 280～285

[6] [6] Hideo Hata, Hideki Nogawa, Shigeyuki Suda. Development of 157-nm full-field scanners[C]. Proc. SPIE, 2004, 5377: 806～815

[7] [7] Kafai Lai, Gregg Gallatin, Mark van de Kerkhof et al.. New paradigm in lens metrology for lithographic scanner: evaluation and exploration[C]. Proc. SPIE, 2004, 5377: 160～171

[8] [8] Yuji Chiba, Kazuhiro Takahashi. New-generation projection optics for ArF lithography[C]. Proc. SPIE, 2002, 4691: 679～686

[10] [10] H. Nomura, T. Sato. Techniques for measuring aberrations in lenses used in photolithography with printed patterns[J]. Appl. Opt., 1999, 38(13): 2800～2807

[11] [11] H. Nomura, K. Tawarayama, T. Kohno. Aberration measurement from specific photolithographic images: a different approach[J]. Appl. Opt., 2000, 39(7): 1136～1147

[12] [12] César M. Garza, Will Conley, Bernie Roman et al.. Ring test aberration determination and device lithography correlation[C]. Proc. SPIE, 2001, 4346: 36～44

[13] [13] Marco Moers, Hans van der Laan, Mark Zellenrath et al.. Application of the aberration ring test (ARTEMISTM) to determine lens quality and predict its lithographic performance[C]. Proc. SPIE, 2001, 4346: 1379～1387

[14] [14] Hans van der Laan, Marcel Dierichs, Henk van Greevenbroek et al.. Aerial image measurement methods for fast aberration set-up and illumination pupil verification[C]. Proc. SPIE, 2001, 4346: 394～407

[15] [15] van der Laan, Marco H. Moers. Method of measuring aberration in an optical imaging system[P]. US Patent 6646729. 2003-11

[16] [16] M. Born, E. Wolf. Principles of Optics[M]. 7th ed. Pergamon, Cambridge, 1999. 517～543