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Chinese Journal of Lasers, Volume. 22, Issue 1, 45(1995)

Multiphoton Ionization and Dissociation of Tetramethylsilane at 410～373 nm Laser Radiation

[in Chinese]1, [in Chinese]2, [in Chinese]3, [in Chinese]2, and [in Chinese]2
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  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Multiphoton Ionization and Dissociation of Tetramethylsilane at 410～373 nm Laser Radiation[J]. Chinese Journal of Lasers, 1995, 22(1): 45

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    Paper Information

    Category: Laser physics

    Received: Apr. 1, 1994

    Accepted: --

    Published Online: Aug. 17, 2007

    The Author Email:

    DOI:

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology