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Chinese Journal of Lasers, Volume. 51, Issue 13, 1311001(2024)

Multidimensional Analysis of Cobalt-Doped Copper Oxide Thin Films Based on Magnetron Sputtering with LIBS

Lili Dong1, Jiasen Wu2, Xiangyu Xia2, Chuanqi Wu2, and Junshan Xiu2、*
Author Affiliations
  • 1School of Chemistry and Chemical Engineering, Shandong University of Technology, Zibo 255000, Shandong , China
  • 2School of Physics and Optoelectronic Engineering, Shandong University of Technology, Zibo 255000, Shandong , China
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    AbstractGet PDF(in Chinese)
    Figures&Tables (7)
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    References (36)
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    Figures & Tables(7)
    Experimental setup of LIBS

    Fig. 1. Experimental setup of LIBS

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    LIBS spectra of Co-doped CuO thin films

    Fig. 2. LIBS spectra of Co-doped CuO thin films

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    Calibration curves of LIBS intensity ratio of Co/Cu under different sputtering parameters. (a) Sputtering pressure; (b) sputtering power

    Fig. 3. Calibration curves of LIBS intensity ratio of Co/Cu under different sputtering parameters. (a) Sputtering pressure; (b) sputtering power

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    LIBS intensity ratio mapping of Co/Cu under different sputtering parameters. (a)‒(d) Different sputtering pressures; (e)‒(h) different sputtering powers

    Fig. 4. LIBS intensity ratio mapping of Co/Cu under different sputtering parameters. (a)‒(d) Different sputtering pressures; (e)‒(h) different sputtering powers

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    Optical transmittance and optical band gap of Co-doped CuO thin films. (a) Optical transmittance values under different sputtering pressures; (b) optical transmittance values under different sputtering powers; (c) optical band gaps under different sputtering pressures; (d) optical band gaps under different sputtering powers

    Fig. 5. Optical transmittance and optical band gap of Co-doped CuO thin films. (a) Optical transmittance values under different sputtering pressures; (b) optical transmittance values under different sputtering powers; (c) optical band gaps under different sputtering pressures; (d) optical band gaps under different sputtering powers

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    Evolution trends of LIBS intensity ratio and optical band gap of Co/Cu with sputtering parameters. (a) Sputtering pressure; (b) sputtering power

    Fig. 6. Evolution trends of LIBS intensity ratio and optical band gap of Co/Cu with sputtering parameters. (a) Sputtering pressure; (b) sputtering power

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    • Table 1. EDS data of Co-doped CuO thin films under different sputtering parameters

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      Table 1. EDS data of Co-doped CuO thin films under different sputtering parameters

      Sputtering parameterAtomic fraction /%Atomic fraction ratio ofCo and Cu
      Time /minPressure /PaPower /WCoCu
      301.09014.31085.6900.167
      2.016.56983.4310.199
      2.515.61084.3900.185
      3.017.49082.5100.212
      2.07517.02082.9800.205
      8515.39884.6020.182
      9514.66085.3400.172
      10013.64486.3560.158
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    Lili Dong, Jiasen Wu, Xiangyu Xia, Chuanqi Wu, Junshan Xiu. Multidimensional Analysis of Cobalt-Doped Copper Oxide Thin Films Based on Magnetron Sputtering with LIBS[J]. Chinese Journal of Lasers, 2024, 51(13): 1311001

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    Paper Information

    Category: spectroscopy

    Received: Sep. 11, 2023

    Accepted: Oct. 27, 2023

    Published Online: Jun. 23, 2024

    The Author Email: Junshan Xiu (xiujunshan@126.com)

    DOI:10.3788/CJL231190

    CSTR:32183.14.CJL231190

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology