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Acta Optica Sinica, Volume. 41, Issue 20, 2031001(2021)

Fabrication of 0.2 nm Bandwidth Filter and Effects of Annealing Temperature on Its Morphology and Characteristics

Kaixuan Wang1,2,3, Gang Chen1,3, Dingquan Liu1,2,3、*, Chong Ma1, Qiuyu Zhang1,2,3, and Lingshan Gao1,3
Author Affiliations
  • 1Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China
  • 2School of Physical Science and Technology, ShanghaiTech University, Shanghai 200031, China
  • 3University of Chinese Academy of Sciences, Beijing 100049, China
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    AbstractGet PDF(in Chinese)
    Figures&Tables (9)
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    References (20)
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    Figures & Tables(9)
    Schematic layout of thin film fabrication system

    Fig. 1. Schematic layout of thin film fabrication system

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    Error sensitivity of each layer in the filter

    Fig. 2. Error sensitivity of each layer in the filter

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    Small square filter

    Fig. 3. Small square filter

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    Measured transmission spectrum of the narrow band-pass filter

    Fig. 4. Measured transmission spectrum of the narrow band-pass filter

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    Transmittance of the filter in logarithmic scale

    Fig. 5. Transmittance of the filter in logarithmic scale

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    Transmittance of filter before and after annealing

    Fig. 6. Transmittance of filter before and after annealing

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    AFM images of the filter before and after annealing. (a) Before annealing; (b) after annealing at 100 ℃; (c) after annealing at 200 ℃; (d) after annealing at 300 ℃

    Fig. 7. AFM images of the filter before and after annealing. (a) Before annealing; (b) after annealing at 100 ℃; (c) after annealing at 200 ℃; (d) after annealing at 300 ℃

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    Cross-sectional SEM images of the filter before and after annealing. (a) Before annealing; (b) after annealing at 100 ℃; (c) after annealing at 200 ℃; (d) after annealing at 300 ℃

    Fig. 8. Cross-sectional SEM images of the filter before and after annealing. (a) Before annealing; (b) after annealing at 100 ℃; (c) after annealing at 200 ℃; (d) after annealing at 300 ℃

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    • Table 1. Surface roughness of the filter before and after annealing

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      Table 1. Surface roughness of the filter before and after annealing

      Surface roughnessBefore annealingAfter annealingat 100 ℃After annealingat 200 ℃After annealingat 300 ℃
      Max /nm2.0620.9322.3702.062
      Min /nm-1.462-1.147-1.262-1.462
      Peak-to-peak /nm3.5252.0793.6323.525
      Root-mean-square /nm0.3550.2500.3160.355
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    Kaixuan Wang, Gang Chen, Dingquan Liu, Chong Ma, Qiuyu Zhang, Lingshan Gao. Fabrication of 0.2 nm Bandwidth Filter and Effects of Annealing Temperature on Its Morphology and Characteristics[J]. Acta Optica Sinica, 2021, 41(20): 2031001

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    Paper Information

    Category: Thin Films

    Received: Apr. 19, 2021

    Accepted: May. 6, 2021

    Published Online: Sep. 30, 2021

    The Author Email: Liu Dingquan (dqliu@mail.sitp.ac.cn)

    DOI:10.3788/AOS202141.2031001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology