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Chinese Journal of Lasers, Volume. 52, Issue 1, 0103102(2025)

Development of High‐Extinction‐Ratio Polarizing Beam Splitter in Laser Communication System

Jing Zhang1,2, Tao Zhu1,2、*, Xiuhua Fu1,2, Yonggang Pan2,3, Zhaowen Lin2,3, Ben Wang2,3, Yang Han4, and Fei Yang5
Author Affiliations
  • 1College of Optoelectronic Engineering, Changchun University of Science and Technology, Changchun 130022, Jilin , China
  • 2Zhongshan Research Institute, Changchun University of Science and Technology, Zhongshan 528436, Guangdong , China
  • 3Zhongshan Jilian Optoelectronic Technology Co., Ltd., Zhongshan 528436, Guangdong , China
  • 4Beijing Golden Way Scientific Co., Ltd., Beijing 100015, China
  • 5Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, Jilin , China
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    AbstractGet PDF(in Chinese)
    Figures&Tables (19)
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    References (18)
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    Figures & Tables(19)
    Schematic diagram of spectral polarization interval

    Fig. 1. Schematic diagram of spectral polarization interval

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    Sensitivity characteristics of different spacer materials

    Fig. 2. Sensitivity characteristics of different spacer materials

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    Schematic diagram of membrane structure

    Fig. 3. Schematic diagram of membrane structure

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    Theoretical transmittance design curves for front face of polarizing beam splitter film. (a) 1450‒1600 nm; (b) 620‒640 nm

    Fig. 4. Theoretical transmittance design curves for front face of polarizing beam splitter film. (a) 1450‒1600 nm; (b) 620‒640 nm

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    Theoretical transmittance design curve of P light anti-reflective film

    Fig. 5. Theoretical transmittance design curve of P light anti-reflective film

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    Theoretical transmittance design curves of polarizing beam splitter. (a) 1450‒1600 nm; (b) 620‒640 nm

    Fig. 6. Theoretical transmittance design curves of polarizing beam splitter. (a) 1450‒1600 nm; (b) 620‒640 nm

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    Each layer thickness distribution of polarizing beam splitter films. (a) Ta2O5; (b) SiO2

    Fig. 7. Each layer thickness distribution of polarizing beam splitter films. (a) Ta2O5; (b) SiO2

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    Relationship between Ta2O5 sensitivity and monitoring wavelength under different thicknesses

    Fig. 8. Relationship between Ta2O5 sensitivity and monitoring wavelength under different thicknesses

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    Relationship between SiO2 sensitivity and monitoring wavelength under different thicknesses

    Fig. 9. Relationship between SiO2 sensitivity and monitoring wavelength under different thicknesses

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    Monitoring design curves of polarizing beam splitter films. (a) 510 nm; (b) 535 nm; (c) 560 nm

    Fig. 10. Monitoring design curves of polarizing beam splitter films. (a) 510 nm; (b) 535 nm; (c) 560 nm

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    Monitoring design curves of P light anti-reflection films

    Fig. 11. Monitoring design curves of P light anti-reflection films

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    Surface shape results after depositing polarizing beam splitter film. (a) Reflection surface shape; (b) transmission surface shape

    Fig. 12. Surface shape results after depositing polarizing beam splitter film. (a) Reflection surface shape; (b) transmission surface shape

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    Fitting curve of substrate RMS change and SiO2 deposition thickness

    Fig. 13. Fitting curve of substrate RMS change and SiO2 deposition thickness

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    Polarizing beam splitter surface shape results. (a) Reflection surface shape; (b) transmission surface shape

    Fig. 14. Polarizing beam splitter surface shape results. (a) Reflection surface shape; (b) transmission surface shape

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    Measured transmittance curves of polarizing beam splitter. (a) 1450‒1600 nm; (b) 620‒640 nm

    Fig. 15. Measured transmittance curves of polarizing beam splitter. (a) 1450‒1600 nm; (b) 620‒640 nm

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    Polarizing beam splitter after environmental testing

    Fig. 16. Polarizing beam splitter after environmental testing

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    • Table 1. Parameters of polarizing beam splitter

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      Table 1. Parameters of polarizing beam splitter

      ParameterValue
      Angle of incidence45°
      SubstrateCorning7980
      Target wavelength1540 nm &1563 nm
      Extinction ratio>5000∶1
      Transmission surface shape<λ/70 （RMS）
      Reflection surface shape<λ/70 （RMS）

    • Table 2. Thin film deposition process parameters

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      Table 2. Thin film deposition process parameters

      Project

      Background vacuum

      degree /（10-4 Pa）

      Deposition

      temperature /℃

      Deposition

      rate /（nm·s-1）

      Voltage in ion beam

      bombardment /V

      Current in ion beam

      bombardment /mA

      Flow in ion beam

      bombardment /sccm

      Ion beam‒‒‒7507508（Ar）， 50（O2）
      Ta2O572500.411509508（Ar）， 50（O2）
      SiO272500.811509508（Ar）， 50（O2）

    • Table 3. Monitoring wavelength selection

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      Table 3. Monitoring wavelength selection

      Monitoring wavelength /nmNumber of layers
      5105‒6，19‒20，35‒36，47‒48，51‒52，63‒64，67‒70，79‒80
      5351‒4，7‒18，21‒34，37‒46，49‒50，53‒60，65‒66，71‒78，81‒82，85‒86
      56061‒62，83‒84
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    Jing Zhang, Tao Zhu, Xiuhua Fu, Yonggang Pan, Zhaowen Lin, Ben Wang, Yang Han, Fei Yang. Development of High‐Extinction‐Ratio Polarizing Beam Splitter in Laser Communication System[J]. Chinese Journal of Lasers, 2025, 52(1): 0103102

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    Paper Information

    Category: Thin Films

    Received: Jul. 5, 2024

    Accepted: Sep. 14, 2024

    Published Online: Jan. 14, 2025

    The Author Email: Zhu Tao (zhutao202406@163.com)

    DOI:10.3788/CJL241033

    CSTR:32183.14.CJL241033

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology