Journal of Infrared and Millimeter Waves, Volume. 39, Issue 3, 290(2020)

Ion-implanted Si:As blocked impurity band detectors for VLWIR detection

Chao WANG1,2, Ning LI1, Ning DAI1、*, Wang-Zhou SHI3, and Gu-Jin HU3
Author Affiliations
  • 1State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai200083, China
  • 2University of Chinese Academy of Sciences, Beijing100049, China
  • 3Department of Physics, College of Mathematics and Science, Shanghai Normal University, Shanghai20024, China
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    Figures & Tables(7)
    Doping profile of As concentration in the infrared-active layer by four-different-energy ion-implanted scheme
    Schematic process flow of the ion-implanted BIB detector
    (a)BIB detector’s partial enlarged detail and( b)package of BIB detector
    Blackbody responsivity vs bias voltage at 5 K
    Dark current vs bias voltage at 5 K
    D* vs bias voltage at 5 K
    PC spectrum at 5 K
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    Chao WANG, Ning LI, Ning DAI, Wang-Zhou SHI, Gu-Jin HU. Ion-implanted Si:As blocked impurity band detectors for VLWIR detection[J]. Journal of Infrared and Millimeter Waves, 2020, 39(3): 290

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    Paper Information

    Category: Materials and Devices

    Received: Oct. 5, 2019

    Accepted: --

    Published Online: Jul. 7, 2020

    The Author Email: Ning DAI (hugj@shnu.edu.cn)

    DOI:10.11972/j.issn.1001-9014.2020.03.004

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