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Chinese Journal of Lasers, Volume. 52, Issue 6, 0603103(2025)

Surface Cladding of Third‑Harmonic Porous SiO2 Antireflective Film

Bin Shen1,2、*, Haiyuan Li1, Xinglong Xie1,2, Xu Zhang1, and Huai Xiong1
Author Affiliations
  • 1Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
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    AbstractGet PDF(in Chinese)
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    Figures & Tables(10)
    Preparation process of third harmonic SiO2 antireflective films

    Fig. 1. Preparation process of third harmonic SiO2 antireflective films

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    Optical properties of the films. (a) Transmittance; (b) refractive index

    Fig. 2. Optical properties of the films. (a) Transmittance; (b) refractive index

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    SEM morphologies of different films. (a) 3AR+5MR; (b) 3AR

    Fig. 3. SEM morphologies of different films. (a) 3AR+5MR; (b) 3AR

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    Transmission uniformity of different films. (a) 3AR+5MR; (b) 3AR

    Fig. 4. Transmission uniformity of different films. (a) 3AR+5MR; (b) 3AR

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    Changes in contact angle between the films and water. (a) 3AR+5MR; (b) 3AR

    Fig. 5. Changes in contact angle between the films and water. (a) 3AR+5MR; (b) 3AR

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    Changes in optical properties of the films after 85%+15% experiment. (a) 3AR+5MR; (b) 3AR

    Fig. 6. Changes in optical properties of the films after 85%+15% experiment. (a) 3AR+5MR; (b) 3AR

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    Changes in optical properties of the films after 85 ℃+85%RH experiment. (a) 3AR+5MR; (b) 3AR

    Fig. 7. Changes in optical properties of the films after 85 ℃+85%RH experiment. (a) 3AR+5MR; (b) 3AR

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    AFM morphology of the films. (a)(d) Original films; (b)(e) after 85%+15% experiment; (c)(f) after 85 ℃+85%RH experiment

    Fig. 8. AFM morphology of the films. (a)(d) Original films; (b)(e) after 85%+15% experiment; (c)(f) after 85 ℃+85%RH experiment

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    Surface roughness of the films

    Fig. 9. Surface roughness of the films

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    Laser induced damage threshold of the films. (a) Original films; (b) after 85%+15% experiment; (c) after 85 ℃+85%RH experiment

    Fig. 10. Laser induced damage threshold of the films. (a) Original films; (b) after 85%+15% experiment; (c) after 85 ℃+85%RH experiment

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    Bin Shen, Haiyuan Li, Xinglong Xie, Xu Zhang, Huai Xiong. Surface Cladding of Third‑Harmonic Porous SiO2 Antireflective Film[J]. Chinese Journal of Lasers, 2025, 52(6): 0603103

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    Paper Information

    Category: Thin Films

    Received: Aug. 2, 2024

    Accepted: Sep. 14, 2024

    Published Online: Mar. 18, 2025

    The Author Email: Bin Shen (bingo2011@siom.ac.cn)

    DOI:10.3788/CJL241113

    CSTR:32183.14.CJL241113

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology