[5] [5] CARR J W.Atmospheric pressure plasma processing for damage-free optics and surfaces[J].Engineering Research Development and Technology,1999,3:31-39.

[6] [6] FANARA C,SHORE P,NICHOLL J R.A New Reactive Atom Plasma Tehcnology (RART) for precision machining:the etching of ULE optical surfaces[J].SPIE,2006,6273:62730A.

[7] [7] MORI Y,YAMAMURA K,ENDO K.Creations of perfect surfaces[J].Journal of Crystal Growth,2005,275:39-50.

[8] [8] MORI Y,YAMAUCHI K,YAMAMURA K,et al..Development of plasma chemical vaporization machining[J].Review of Scientific Instruments,2000,71(12):4627-4632.

[9] [9] KE Y K,DONG H R.Analytical Chemistry Manual (Ⅲ):Spectral Analysis[M].Chemical Industry Press,1998.

[10] [10] DEAN J A.Analytical Chemistry Handbook[M].Translated by CHANG W B,China:Science Press,2003.