Laser Induced Damage of SiO<sub>2</sub> and CaF<sub>2</sub> under 263 nm

Xiuqing Jiang; Dong Liu; Lailin Ji; Shunxing Tang; Yajing Guo; Baoqiang Zhu; Yanqi Gao; Zunqi Lin

doi:10.1117/12.2186012

Collection Of theses on high power laser and plasma physics, Volume. 13, Issue 1, 95320(2015)

Laser Induced Damage of SiO₂ and CaF₂ under 263 nm

Xiuqing Jiang^1,2, Dong Liu³, Lailin Ji³, Shunxing Tang¹, Yajing Guo¹, Baoqiang Zhu¹, Yanqi Gao³, and Zunqi Lin¹

¹National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, 201800 China

²University of Chinese Academy of Sciences, Beijing, 100049 China

³Shanghai Institute of Laser Plasma, Chinese Academy of Engineer Physics, Shanghai, 201800, China

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Xiuqing Jiang, Dong Liu, Lailin Ji, Shunxing Tang, Yajing Guo, Baoqiang Zhu, Yanqi Gao, Zunqi Lin. Laser Induced Damage of SiO₂ and CaF₂ under 263 nm[J]. Collection Of theses on high power laser and plasma physics, 2015, 13(1): 95320

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Published Online: May. 27, 2017

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DOI:10.1117/12.2186012

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology