Chinese Optics Letters, Volume. 22, Issue 11, 112201(2024)

Fabrication-constrained inverse design and demonstration of high-performance grating couplers

Xin Jin1,2, Jinbin Xu1,2, Yaqian Li1,2, Cuiwei Xue2,3, Rujun Liao2,4, Liucheng Fu2, Min Liu2, Yunliang Shen2, Xueling Quan2, and Xiulan Cheng2、*
Author Affiliations
  • 1Department of Electronic Engineering, Shanghai Jiao Tong University, Shanghai 200240, China
  • 2Center for Advanced Electronic Materials and Devices, Shanghai Jiao Tong University, Shanghai 200240, China
  • 3State Key Laboratory of Metal Matrix Composites, School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai 200240, China
  • 4Department of Micro/Nano Electronics, Shanghai Jiao Tong University, Shanghai 200240, China
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    Figures & Tables(9)
    Schematic diagram of optimized GC. TOX, top oxide; BOX, bottom oxide.
    The simulated CE as a function of (a) etch depth; (b) TOX thickness.
    Simulated transmission spectra of UGC and optimized GCs with various fabrication constraints.
    Electric field distribution of the optimized GC.
    (a) Top view and (b) partial enlarged drawing of an SEM micrograph of an optimized GC fabricated by EBL.
    3D morphologies and etch depths at the (a), (c) widest and (b), (d) narrowest grooves of the EBL-fabricated GC.
    Simulation and experimental transmission spectra of optimized GCs with various MFSs.
    Measured transmission spectra of optimized GCs with (a) 60, (b) 100, (c) 130, (d) 160 nm MFSs at various groove width variables.
    • Table 1. Summary of the Simulated (Sim) and Experimental (Exp) CEs for Different GCs Reported in the Literatures

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      Table 1. Summary of the Simulated (Sim) and Experimental (Exp) CEs for Different GCs Reported in the Literatures

      Ref.SOI (nm)StructureBandMFS (nm)Sim CE (dB)Exp CE (dB)Process
      [10]220Multilayer etchingC200−2.4−4.2248 nm DUV
      [13]220BBGCC74−2.2−4.1EBL
      [14]220BBGCC57−1.78−3.69EBL
      [20]220ApodizationC30−2.15
      [11]220ApodizationC100−1.9
      [23]220ApodizationC180−2.6−3.1248 nm DUV
      [12]220ApodizationC60−1.6
      [25]220ApodizationC100−1.94
      [29]220ApodizationC50−2.13
      This work220Improved apodizationC60−1.55−2.70EBL
      100−1.63−2.89
      130−1.69−2.83
      160−2.02−3.31
      180−2.29−3.72
      180−2.29−2.77248 nm DUV
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    Xin Jin, Jinbin Xu, Yaqian Li, Cuiwei Xue, Rujun Liao, Liucheng Fu, Min Liu, Yunliang Shen, Xueling Quan, Xiulan Cheng, "Fabrication-constrained inverse design and demonstration of high-performance grating couplers," Chin. Opt. Lett. 22, 112201 (2024)

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Apr. 23, 2024

    Accepted: May. 31, 2024

    Posted: Jun. 3, 2024

    Published Online: Nov. 26, 2024

    The Author Email: Xiulan Cheng (xlcheng@sjtu.edu.cn)

    DOI:10.3788/COL202422.112201

    CSTR:32184.14.COL202422.112201

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