Fig. 1. Schematic diagram of main part for ion source

Fig. 2. Transmission spectra of Ta₂O₅ optical film under different currents of ion source

Fig. 3. Transmission spectra of SiO₂ optical film under different currents of ion source

Fig. 4. Variation in absorbance of two materials with current of ion source (wavelength of 1000 nm)

Fig. 5. Variation in refractive index of the two materials with current of ion source (wavelength of 550 nm)

Fig. 6. Transmission spectra of Ta₂O₅ optical film under different voltages of ion source

Fig. 7. Transmission spectra of SiO₂ optical film under different voltages of ion source

Fig. 8. Variation in absorbance of two materials with voltage of ion source (wavelength of 1000 nm)

Fig. 9. Variation in refractive index of the two materials with voltage of ion source (wavelength of 550 nm)

Fig. 10. Transmission spectra of Ta₂O₅ optical film under different bias voltages of ion source

Fig. 11. Transmission spectra of SiO₂ optical film under different bias voltages of ion source

Fig. 12. Variation in absorbance of two materials with bias voltage of ion source (wavelength of 1000 nm)

Fig. 13. Variation in refractive index of two materials with bias voltages of ion source (wavelength of 550 nm)

Fig. 14. Optical properties of Ta₂O₅ thin film under different flow rates of working gas. (a) Absorbance (wavelength of 1000 nm); (b) refractive index (wavelength of 550 nm)

Fig. 15. Optical properties of SiO₂ thin film under different flow rates of working gas. (a) Absorbance (wavelength of 1000 nm); (b) refractive index (wavelength of 550 nm)