Laser & Optoelectronics Progress, Volume. 58, Issue 15, 1516028(2021)
Numerical Simulation of the Thermal Stresses of Layered Molybdenum Disulfide
Fig. 1. Schematic of SiO2 based MoS2 film model. (a) Schematic of substrate supported MoS2 model;(b) schematic of the suspended MoS2 model
Fig. 2. Thermal expansion coefficients of MoS2 and SiO2. (a) Thermal expansion coefficient as a function of temperature; (b) gradient of thermal expansion coefficient changed with temperature
Fig. 3. Thermal stress distribution. (a) Suspended MoS2 at 293 K; (b) substrate supported MoS2 at 293 K; (c) suspended MoS2 at 200 K; (d) substrate supported MoS2 at 200 K; (e) suspended MoS2 at 100 K; (f) substrate supported MoS2 at 100 K
Fig. 7. Thermal stress distribution at central point of MoS2. (a)The dependence of the thermal stress at central point on the thickness of substrate;(b) gradient of the thermal stress at central point as a function of the thickness of substrate
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Zhongtao Lin, Lianchun Long, Yang Yang, Wuguo Liu. Numerical Simulation of the Thermal Stresses of Layered Molybdenum Disulfide[J]. Laser & Optoelectronics Progress, 2021, 58(15): 1516028
Category: Materials
Received: Nov. 18, 2020
Accepted: Jan. 20, 2021
Published Online: Jul. 28, 2021
The Author Email: Yang Yang (yang.yang@iphy.ac.cn)