OPTICS & OPTOELECTRONIC TECHNOLOGY, Volume. 18, Issue 1, 59(2020)

Study on Film Thickness Distribution of Hemispherical Lens

ZHU Yuan-qiang
Author Affiliations
  • [in Chinese]
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    References(6)

    [1] [1] K H Guenther. Optical thin films deposited by energetic particle processes[C]. SPIE, 1992, 782: 344-355.

              K H Guenther. Optical thin films deposited by energetic particle processes[C]. SPIE, 1992, 782: 344-355.

    [3] [3] Francisco Villa, Octavio Pompa. Emission pattern of real vapor source in high vacuum: an overview[J]. Applied Optics, 1999, 38(4): 695-703.

              Francisco Villa, Octavio Pompa. Emission pattern of real vapor source in high vacuum: an overview[J]. Applied Optics, 1999, 38(4): 695-703.

    [4] [4] Francisco Villa, Amalia Martinez, et al. Correction masks for thickness uniformity in large-area thin film[J]. Applied Optics, 2003, 39(10): 1602-1610.

              Francisco Villa, Amalia Martinez, et al. Correction masks for thickness uniformity in large-area thin film[J]. Applied Optics, 2003, 39(10): 1602-1610.

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    ZHU Yuan-qiang. Study on Film Thickness Distribution of Hemispherical Lens[J]. OPTICS & OPTOELECTRONIC TECHNOLOGY, 2020, 18(1): 59

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    Paper Information

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    Received: Aug. 3, 2019

    Accepted: --

    Published Online: Aug. 8, 2020

    The Author Email:

    DOI:

    CSTR:32186.14.

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