[1] [1] Yuan Qiongyan, Wang Xiangzhao. Recent development of international mainstream lithographic tools[J]. Laser & Optoelectronics Progress, 2007, 44(1): 57-64.

[2] [2] Zhang Qiang, Hu Song, Yao Hanmin, et al.. Current progress of optical lithography in ASML[J]. Microfabrication Technology, 2002, (3): 8-11.

[3] [3] Levinson Harry J. Principles of Lithography[M]. Washington: SPIE Press, 2001.

[4] [4] Bernard Fay. Advanced optical lithography development, from UV to EUV[J]. Microelectronic Engineering, 2002, 61-62: 11-24.

[5] [5] M Switkes, R R Kunz, R F Sinta, et al.. Immersion liquids for lithography in the deep ultraviolet[C]. SPIE, 2003, 5040: 690-699.

[6] [6] Wang Fan, Wang Xiangzhao, Ma Mingying, et al.. An novel technique for measuring full Image quality of lithography tools in situ[J]. Chinese J Lasers, 2006, 33(4): 543-548.

[7] [7] Guo Liping, Huang Huijie, Wang Xiangzhao. Off-axis illumination for optical lithography[J]. Laser Journal, 2005, 26(1): 23-25.

[8] [8] Gong Yan, Zhang Wei. Present status and progress in 193 nm exposure system in lithography[J]. Chinese Journal of Optics and Applied Optics, 2008, 1(1): 25-35.

[9] [9] Yu Yinshan, You Libing, Liang Xu, et al.. Progress of excimer lasers technology[J]. Chinese J Lasers, 2010, 37(9): 2253-2270.

[10] [10] Cai Yanmin, Wang Xiangzhao, Huang Huijie. Design of Wollaston prism used for polarization illumination system in ArF lithography tool[J]. Chinese J Lasers, 2014, 41(6): 0616002.

[11] [11] Chen Jinxin, Xu Xiangyu, Wang Yu. Electrodes system design and electric field simulation research of ArF excimer laser[J]. Laser & Optoelectronics Progress, 2014, 51(1): 011402.

[12] [12] David H Tracy, Fred Y Wu. Exposure dose control techniques for excimer laser lithography[C]. SPIE, 1988, 922:437-443.

[13] [13] Liu Shiyuan, Wu Xiaojian. Real-time exposure dose control algorithm for DUV excimer lasers[J]. Acta Optica Sinica, 2006, 26(6): 878-884.

[14] [14] Liang Xu, You Libing, Wang Tao, et al.. Excimer pulse energy stabilization realized by charging voltage realtime adjusting[J]. Chinese J Lasers, 2010, 37(2): 374-378.

[15] [15] Hu Juntao, Liu Xiang, Zhang Guoyong, et al.. A real-time energy meter for medical excimer laser[J]. Chinese J Lasers, 2007, 34(12): 1732-1735.

[16] [16] Liang Xu, You Libing, Yu Yinshan. Excimer laser pulse energy detection under pulse repetition running mode[J]. Chinese Journal of Quantum Electronics, 2010, 27(3): 281-287.