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Chinese Optics Letters, Volume. 20, Issue 11, 113601(2022)

Fast dual-beam alignment method for stimulated emission depletion microscopy using aggregation-induced emission dye resin

Miao Zhao1,2, Fengming Liu3, Yang Yu3, Xinjun Guo1, Hao Ruan1、*, and Jing Wen4
Author Affiliations
  • 1Laboratory of Micro-Nano Optoelectronic Materials and Devices, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
  • 3National Center for Protein Science Shanghai, Shanghai 200120, China
  • 4Engineering Research Center of Optical Instrument and Systems, Ministry of Education and Shanghai Key Laboratory of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China
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    Miao Zhao, Fengming Liu, Yang Yu, Xinjun Guo, Hao Ruan, Jing Wen, "Fast dual-beam alignment method for stimulated emission depletion microscopy using aggregation-induced emission dye resin," Chin. Opt. Lett. 20, 113601 (2022)

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    Paper Information

    Category: Nanophotonics, Metamaterials, and Plasmonics

    Received: Feb. 9, 2022

    Accepted: May. 31, 2022

    Posted: Jun. 1, 2022

    Published Online: Jun. 29, 2022

    The Author Email: Hao Ruan (ruanhao@mail.shcnc.ac.cn)

    DOI:10.3788/COL202220.113601

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology