[1] [1] Ulrich Kogelschatz. IEEE Trans. on Plasma Sci., 2002, 30(4): 1400.

[2] [2] Xu Xueji. Thin Solid Films, 2001, 390(2): 237.

[3] [3] Massines F, Gherardi N, Naude N, et al. Eur. Phys.J. Appl. Phys., 2009, 47: 22805.

[4] [4] Takaki K, Fujiwara T. IEEE Trans. on Plasma Sci., 2001, 29(3): 518.

[5] [5] Li X C, Jia P Y, Yuan N, et al. Phys. Plasmas, 2011, 18: 043505.

[6] [6] Yang D Z, Yang Y, Li S Z, et al. Plasma Sources Sci. Technol., 2012, 21: 035004.

[7] [7] Uhm H S, Lim J P, Li S Z. Appl. Phys. Lett., 2007, 90(26): 261501.

[8] [8] Moravej M, Yang X, Hicks R F, et al. Journal of Applied Physics, 2006, 99(9): 093305.

[9] [9] Shirai H, Kobayashi T, Hasegawa Y. Appl. Phys. Lett., 2005, 87: 143112.

[10] [10] Li S Z, Huang W T, Zhang J L, et al. Appl. Phys. Lett., 2009, 94: 111501.

[11] [11] Park H D, Dhali S K. Appl. Phys. Lett., 2000, 77(14): 2112.